Plasma Processing and Technology International Conference 2022

Conference Speakers

Keynote Speakers

Prof. Jochen Schein

University of Federal Armed Forces Munich, Germany

Jochen Schein studied electrical engineering at the Ruhr University and had his Phd in plasma technology in 1996. From 1996 to 1998 he was a postdoc in plasma diagnostics at the Department for Mechanical Engineering at the University of Minnesota (USA). He then moved to Alameda Applied Sciences Corp. as a Principal Scientist. in California (USA), where he worked in the field of satellite propulsion. From 2004 to 2006 he was a Senior Scientist at the Lawrence Livermore National Laboratory on the National Ignition Facility's fusion experiments in that laboratory. Since August 2006 he is a professor at the Institute for Plasma Technology and Mathematics within the Faculty for Electrical Engineering and Information Technology at the University of the Federal Armed Forces in Munich. His research interests are in plasma physics, plasma technology and satellite propulsion.


Prof. Stéphane Béchu

CNRS- Grenoble University, France

S. Béchu received the Ph.D. degree in Molecular Physics from Paris-Sud University, France, in 1996. He obtained a permanent position at CNRS (French National Centre for Scientific Research) as researcher in 1997. He is research director at CNRS since 2017. His first field of interest was electric propulsion at ICARE lab. in Orleans (France) where he developed plasma diagnostics. Since 2004, at LPSC Lab. in Grenoble (France) his body of research is devoted to plasma diagnostics and ECR (2.45 GHz) plasma sources. Recently, he performed VUV-absorption experiments at SOLEIL synchrotron (DESIRS beam line) on H2, D2 ro-vibrationally excited molecules.


Prof. Michael Keidar

The George Washington University, USA

Dr. Michael Keidar is A. James Clark Professor of Engineering. His research concerns advanced spacecraft propulsion, plasma-based nanotechnology, and plasma medicine. He has authored over 240 journal articles and author of textbook “Plasma Engineering: from Aerospace and Nano and Bio technology” (Elsevier, March 2013). He received 2017 Davidson award in plasma physics. In 2016 he was elected AIAA National Capital Section Engineer of the Year and in 2017 he received AIAA Engineer of the Year award for his work on micropropulsion resulted in successful launch of nanosatellite with thrusters developed by his laboratory. Many of his papers have been featured on the cover of high impact journals and his research has been covered by various media outlets. Prof. Keidar serves as an AIP Advances academic editor, Associate Editor of IEEE Transactions in Radiation and Plasma Medical Sciences and member of editorial board of half dozen of journals. He is Fellow of APS and Associate Fellow of AIAA.


Dr. Fabio Palumbo

University of Bari, Italy

Expert in plasma processing and chemical characterization of surfaces for various industrial application. Nowadays the research activity is mainly focused on the following fields:

  • Plasma deposition of inorganic thin films as dielectrics in microelectronics and for the corrosion protection
  • Plasma deposition of Pt containing films as catalytic electrodes in fuel cells
  • Nanotexturing processing of polymers for super-hydrophobic/hydrophilic materials

Dr. Qi Hua Fan

Michigan State University, USA

Dr. Qi Hua Fan received his Ph.D. in applied physics from the University of Aveiro in 1999. He is currently an Associate Professor at Michigan State University with joint appointment in the Department of Electrical and Computer Engineering and the Department of Chemical Engineering and Materials Science. He is also a member of the Fraunhofer Center for Coatings and Diamond Technologies. Dr. Fan’s research interests include plasma sources for large-area coatings and plasma processing of nanostructured materials for energy harvesting, energy storage, and electro-optical devices. Dr. Fan teaches both undergraduate and graduate courses in ECE and CheMS departments. Typical courses include Plasma-Assisted Materials Processing, Thin Film Optics and Engineering, and Materials Science.